Optical Diagnostics for Thin Film Processing
Optical Diagnostics for Thin Film Processing describes the increasing role of in situ optical
diagnostics in thin film processing for applications ranging from
fundamental science studies to process development to control during
manufacturing. The key advantage of optical diagnostics in these
applications is that they are usually noninvasive and nonintrusive.
Optical probes of the surface, film, wafer, and gas above the wafer are
described for many processes, including plasma etching, MBE, MOCVD, and
rapid thermal processing. For each optical technique, the underlying
principles are presented, modes of experimental implementation are
described, and applications of the diagnostics in thin film processing
are analyzed, with examples drawn from microelectronics and
optoelectronics. Special attention is paid to real-time probing of the
surface, to the noninvasive measurement of temperature, and to the use
of optical probes for process control.
This text can be used by students and those new to the topic as an
introduction and review of the subject. It also serves as a
comprehensive resource for engineers, technicians, researchers, and
scientists already working in the field.
ISBN 0-12-342070-9
For an update see the invited review article
"Optical Diagnostics for Thin Film Processing", Annu. Rev. Phys. Chem. 54, 277-305 (2003).